Test pattern for measuring line width of electrode and method fo

Details Test pattern for measuring line width of electrode and method fo Test pattern for measuring line width of electrode and method fo

1997-01-02

1998-11-10

Thomas, Tom

Active solid-state devices (e.g., transistors, solid-state diode

Test or calibration structure

H01L 2358

Patent

active

058347950

ABSTRACT:
A test pattern for measuring a line width of an electrode includes a substrate; an electrode having a predetermined line width and length formed on the substrate; and, a plurality of lines extended from both ends of the electrode, whereby, first, a line width of a gate electrode in a transistor is measured accurately; second, a change in electrical characteristics of a transistor with respect to the change of the line width of a gate electrode during a fabrication process can be accurately revealed; third, comparison of changes in the line widths of a gate electrode during fabrication measured through an SEM and after completion of fabrication can be done easily; and fourth, a reliability of a completed device is easily assessable.

REFERENCES:
patent: 3974443 (1976-08-01), Thomas
patent: 4347479 (1982-08-01), Cullet
patent: 4516071 (1985-05-01), Buehler
patent: 4978923 (1990-12-01), Maltiel
patent: 5477062 (1995-12-01), Natsume

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