Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-07-10
2007-07-10
Whitmore, Stacy A (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C700S121000, C702S097000
Reexamination Certificate
active
10321281
ABSTRACT:
A mask design is generated for patterning a test wafer using a lithographic or etch process, the process is characterized based on the patterned test wafer, and a pattern-dependent model is used based on the characterization to predict characteristics of integrated circuits that are to be fabricated by the lithographic or etch process.
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Smith Taber H.
White David
Bingham & McCutchen LLP
Praesagus, Inc.
Whitmore Stacy A
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