Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-01-16
2007-01-16
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C356S124000, C430S030000, C438S243000
Reexamination Certificate
active
10709075
ABSTRACT:
An H-shaped test key layout for exclusively monitoring 3-foil lens aberration effects during the fabrication of deep-trench capacitor memory devices is disclosed. The COMA lens aberration effect that used to occur along with the 3-foil lens aberration effect is now eliminated by this test key layout.
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Dinh Paul
Hsu Winston
Nanya Technology Corp.
Rossoshek Helen
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