Tertiary alcohol compounds having alicyclic structure

Details Tertiary alcohol compounds having alicyclic structure Tertiary alcohol compounds having alicyclic structure

2006-04-18

2006-04-18

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C526S075000, C526S325000

Reexamination Certificate

active

07029822

ABSTRACT:
Tertiary alcohol compounds of formula (1) are novel wherein R1and R2are C1–10 alkyl groups which may have halogen substituents, or R1and R2may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1–10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, etching resistance and substrate adhesion

REFERENCES:
patent: 6312865 (2001-11-01), Jung et al.
patent: 6774258 (2004-08-01), Hasegawa et al.
patent: 19860767 (1999-07-01), None
Translation of JP-2000-378693 as Submitted in Parent Document.

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