Temperature probe and measurement method for low pressure proces

Details Temperature probe and measurement method for low pressure proces Temperature probe and measurement method for low pressure proces

1998-12-17

2000-08-29

Beck, Shrive

Coating apparatus

Gas or vapor deposition

With treating means

156345, 374208, 165 801, C23C 1600, H05H 100

Patent

active

061102881

ABSTRACT:
A temperature probe for use in low pressure processes having an improved thermal response wherein fluid is supplied to a fluid transport passageway in the probe head for creating an increased pressure between the probe head and a semiconductor wafer for increasing the thermal conductivity therebetween.

REFERENCES:
patent: 4457359 (1984-07-01), Holden
patent: 4909314 (1990-03-01), Lamont, Jr.
patent: 4949783 (1990-08-01), Lakios et al.
patent: 5761023 (1998-06-01), Lue et al.
patent: 5775416 (1998-07-01), Heimanson et al.
patent: 5791782 (1998-08-01), Wooten et al.

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