Temperature control system for semiconductor processing faciliti

Heat exchange – With timer – programmer – time delay – or condition responsive... – Having heating and cooling capability

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

165 804, 165 802, F24F 300

Patent

active

060268964

ABSTRACT:
The present invention generally provides a system for controlling the temperature of multiple components of a semiconductor processing device or fabrication facility. The system includes a common source of a heated or chilled fluid that is distributed to multiple process components for use in heating or cooling. The multiple process components may be part of the same chamber or process, serve different processes in the same or different cluster tool, serve a combination of stand-alone and cluster tools, or any combination of process components located in a common fabrication facility. Each process component includes a flow control valve that controls the temperature of each component.

REFERENCES:
patent: 2357706 (1944-09-01), Toepperwein
patent: 3236292 (1966-02-01), Smith, Jr.
patent: 3735805 (1973-05-01), Stillhard
patent: 3847209 (1974-11-01), Mascall
patent: 4065369 (1977-12-01), Ogawa et al.
patent: 4423303 (1983-12-01), Hirose et al.
patent: 4621678 (1986-11-01), Hahn et al.
patent: 4651813 (1987-03-01), Witt et al.
patent: 4729424 (1988-03-01), Mizuno et al.
patent: 4747928 (1988-05-01), Takahashi et al.
patent: 4804431 (1989-02-01), Ribner
patent: 4902099 (1990-02-01), Okamoto et al.
patent: 5029445 (1991-07-01), Higgins
patent: 5154661 (1992-10-01), Higgins
patent: 5320982 (1994-06-01), Tsubone et al.
patent: 5348076 (1994-09-01), Asakawa
patent: 5349154 (1994-09-01), Harker et al.
patent: 5359177 (1994-10-01), Taki et al.
patent: 5413164 (1995-05-01), Teshima et al.
patent: 5450726 (1995-09-01), Higgins
patent: 5494494 (1996-02-01), Mizuno et al.
patent: 5535818 (1996-07-01), Fujisaki et al.
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5567267 (1996-10-01), Kazama et al.
patent: 5579826 (1996-12-01), Hamilton et al.
patent: 5592358 (1997-01-01), Shamouilian et al.
patent: 5607009 (1997-03-01), Turner et al.
patent: 5613364 (1997-03-01), Higgins
patent: 5706890 (1998-01-01), Sloan et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Temperature control system for semiconductor processing faciliti does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Temperature control system for semiconductor processing faciliti, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Temperature control system for semiconductor processing faciliti will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-513452

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.