TEM sample preparation from a circuit layer structure

Details TEM sample preparation from a circuit layer structure TEM sample preparation from a circuit layer structure

2008-01-08

2008-01-08

Vanore, David (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Methods

C250S311000, C250S492210, C315S382000, C430S005000

Reexamination Certificate

active

07317188

ABSTRACT:
A method of TEM sample preparation from a circuit layer structure, the method comprising electron-beam assisted deposition of a first protective layer over a site of interest of the circuit layer structure; ion-beam assisted deposition of a second protective layer over the first protective layer; and ion-beam milling at the site of interest through the first and second protective layers.

REFERENCES:
patent: 5104684 (1992-04-01), Tao et al.
patent: 6368753 (2002-04-01), Harriott et al.
patent: 6664552 (2003-12-01), Shichi et al.
patent: 6693290 (2004-02-01), Yamaguchi
patent: 6753538 (2004-06-01), Musil et al.
patent: 6943507 (2005-09-01), Winkler et al.
patent: 7180061 (2007-02-01), Lu

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