Techniques for confining electrons in an ion implanter

Details Techniques for confining electrons in an ion implanter Techniques for confining electrons in an ion implanter

2006-12-07

2010-02-02

Nguyen, Kiet T (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S492210

Reexamination Certificate

active

07655922

ABSTRACT:
Techniques for confining electrons in an ion implanter are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for confining electrons in an ion implanter. The apparatus may comprise a first array of magnets and a second array of magnets positioned along at least a portion of a beam path, the first array being on a first side of the beam path and the second array being on a second side of the beam path, the first side opposing the second side. At least one magnet in the first array may have a pole facing an opposite pole of a corresponding magnet in the second array.

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