Technique for the fabrication of an iron oxide mask

Details Technique for the fabrication of an iron oxide mask Technique for the fabrication of an iron oxide mask

1982-06-02

1983-12-27

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156667, 427143, 427166, 4272553, 4274192, B05D 506, B41N 124

Patent

active

044228988

ABSTRACT:
Iron oxide films for "see-through" photomasks are deposited upon heated substrates by chemical vapor deposition from iron pentacarbonyl in the presence of oxygen. The solubility of the iron oxide film is found to be higher, the lower the temperature of the substrate during deposition. At temperatures below 160 degrees C., films are obtained which can be patterned at reasonable rates by photolithographic procedures using conventional mild etchants.

REFERENCES:
patent: 2642339 (1953-06-01), Sawyer
patent: 2919207 (1959-12-01), Scholzel

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