Technique for ion beam angle spread control

Details Technique for ion beam angle spread control Technique for ion beam angle spread control

2011-01-11

2011-01-11

Johnston, Phillip A (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S3960ML

Reexamination Certificate

active

07868305

ABSTRACT:
A technique for ion beam angle spread control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread control. The method may comprise directing one or more ion beams at a substrate surface at two or more different incident angles, thereby exposing the substrate surface to a controlled spread of ion beam incident angles.

REFERENCES:
patent: 4847504 (1989-07-01), Aitken
patent: 5013673 (1991-05-01), Fuse
patent: 5099130 (1992-03-01), Aitken
patent: 5132544 (1992-07-01), Glavish
patent: 5892235 (1999-04-01), Yamazaki et al.
patent: 6229148 (2001-05-01), Prall et al.
patent: 6437350 (2002-08-01), Olson et al.
patent: 6633046 (2003-10-01), Mitchell et al.
patent: 6791094 (2004-09-01), Olson et al.
patent: 6806479 (2004-10-01), Wan et al.
patent: 6807519 (2004-10-01), Stanton
patent: 2002/0121889 (2002-09-01), Larsen et al.
patent: 2004/0063262 (2004-04-01), Feudel et al.
patent: 2005/0082498 (2005-04-01), White
patent: WO0219374 (2002-03-01), None
Campbell, et al., “Beam Angle Control on the VIISTa 80 Ion Implanter,” IIT Proceedings, 2002, pp. 193-196.

Affiliated with

Also associated with

Rating

Technique for ion beam angle spread control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Technique for ion beam angle spread control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Technique for ion beam angle spread control will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2685583