Technique for improving ion implanter productivity

Details Technique for improving ion implanter productivity Technique for improving ion implanter productivity

2006-03-31

2008-11-04

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100

Reexamination Certificate

active

07446326

ABSTRACT:
A technique for improving ion implanter productivity is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving productivity of an ion implanter having an ion source chamber. The method may comprise supplying a gaseous substance to the ion source chamber, the gaseous substance comprising one or more reactive species for generating ions for the ion implanter. The method may also comprise stopping the supply of the gaseous substance to the ion source chamber. The method may further comprise supplying a hydrogen containing gas to the ion source chamber for a period of time after stopping the supply of the gaseous substance.

REFERENCES:
patent: 3904505 (1975-09-01), Aisenberg
patent: 4595837 (1986-06-01), Wu et al.
patent: 4608513 (1986-08-01), Thompson
patent: 4698236 (1987-10-01), Kellogg et al.
patent: 4754200 (1988-06-01), Plumb et al.
patent: 4891525 (1990-01-01), Frisa et al.
patent: 4914305 (1990-04-01), Benveniste et al.
patent: 5023458 (1991-06-01), Benveniste et al.
patent: 5026997 (1991-06-01), Benveniste
patent: 5089746 (1992-02-01), Rosenblum et al.
patent: 5107170 (1992-04-01), Ishikawa et al.
patent: 5189303 (1993-02-01), Tanjyo et al.
patent: 5218210 (1993-06-01), McIntyre, Jr. et al.
patent: 5262652 (1993-11-01), Bright et al.
patent: 5306921 (1994-04-01), Tanaka et al.
patent: 5315118 (1994-05-01), Mous
patent: 5420415 (1995-05-01), Trueira
patent: 5497006 (1996-03-01), Sferlazzo et al.
patent: 5517077 (1996-05-01), Bright et al.
patent: 5523652 (1996-06-01), Sferlazzo et al.
patent: 5554852 (1996-09-01), Bright et al.
patent: 5661308 (1997-08-01), Benveniste et al.
patent: 5703372 (1997-12-01), Horsky et al.
patent: 5736743 (1998-04-01), Benveniste
patent: 5763890 (1998-06-01), Cloutier et al.
patent: 5763895 (1998-06-01), Tien et al.
patent: 5883393 (1999-03-01), Tien et al.
patent: 5886355 (1999-03-01), Bright et al.
patent: 5914494 (1999-06-01), Abbott
patent: 5925886 (1999-07-01), Seki et al.
patent: 5977552 (1999-11-01), Foad
patent: 6016036 (2000-01-01), Brailove
patent: 6037600 (2000-03-01), Tung
patent: 6060718 (2000-05-01), Brailove et al.
patent: 6060836 (2000-05-01), Maeno et al.
patent: 6084241 (2000-07-01), Sitter
patent: 6107634 (2000-08-01), Horsky
patent: 6135128 (2000-10-01), Graf et al.
patent: 6169288 (2001-01-01), Horino et al.
patent: 6184532 (2001-02-01), Dudnikov et al.
patent: 6184624 (2001-02-01), Inouchi
patent: 6204508 (2001-03-01), Chen et al.
patent: 6215125 (2001-04-01), Chen et al.
patent: 6239440 (2001-05-01), Abbott
patent: 6259210 (2001-07-01), Wells
patent: 6288403 (2001-09-01), Horsky et al.
patent: 6291827 (2001-09-01), Tsai et al.
patent: 6294862 (2001-09-01), Brailove
patent: 6331713 (2001-12-01), Smick et al.
patent: 6355933 (2002-03-01), Tripsas et al.
patent: 6392244 (2002-05-01), Grannen et al.
patent: 6479828 (2002-11-01), Perel
patent: 6497744 (2002-12-01), Yamashita
patent: 6515290 (2003-02-01), Rzeszut et al.
patent: 6525482 (2003-02-01), Miyamoto
patent: 6555831 (2003-04-01), Konishi et al.
patent: 6559462 (2003-05-01), Carpenter et al.
patent: 6570166 (2003-05-01), Yamashita
patent: 6576909 (2003-06-01), Donaldson et al.
patent: 6583427 (2003-06-01), Edmonds et al.
patent: 6583544 (2003-06-01), Horsky et al.
patent: 6593580 (2003-07-01), Miyabayashi
patent: 6633133 (2003-10-01), Ishida
patent: 6635889 (2003-10-01), Tsukihara et al.
patent: 6639223 (2003-10-01), Reyes
patent: 6639229 (2003-10-01), Chakor
patent: 6646268 (2003-11-01), Murakoshi et al.
patent: 6661014 (2003-12-01), Reyes
patent: 6664547 (2003-12-01), Benveniste
patent: 6664548 (2003-12-01), Benveniste et al.
patent: 6670623 (2003-12-01), Vella
patent: 6683317 (2004-01-01), Simmons et al.
patent: 6686601 (2004-02-01), Murrell et al.
patent: 6693289 (2004-02-01), March et al.
patent: 6696793 (2004-02-01), Yamashita
patent: 6756600 (2004-06-01), Ng et al.
patent: 6768121 (2004-07-01), Horsky et al.
patent: 6777686 (2004-08-01), Olson et al.
patent: 6777699 (2004-08-01), Miley et al.
patent: 6797964 (2004-09-01), Yamashita
patent: 6815690 (2004-11-01), Veerasamy et al.
patent: 6818909 (2004-11-01), Murrell et al.
patent: 6847043 (2005-01-01), Murrell et al.
patent: 6878946 (2005-04-01), Farley et al.
patent: 6905947 (2005-06-01), Goldberg
patent: 2004/0000651 (2004-01-01), Horsky et al.
patent: WO 2005/093777 (2005-10-01), None
patent: WO 2005/093777 (2005-10-01), None
patent: WO 2006/015072 (2006-02-01), None

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