Technique for extending the limits of photolithography

Details Technique for extending the limits of photolithography Technique for extending the limits of photolithography

1998-07-16

2000-10-31

Niebling, John F.

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438584, 438639, H01L 2144

Patent

active

061402176

ABSTRACT:
A method of forming a wiring pattern in a device comprises forming an array of grooves in a mask, forming first spacers adjacent vertical walls of the grooves, removing the mask, forming second spacers adjacent the first spacers, and filling areas between the first spacers and areas between the second spacers with a material to form the wiring pattern.

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