Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate
2009-04-14
2011-12-20
Kik, Phallaka (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Analysis and verification
C716S053000, C716S054000, C716S055000, C716S111000, C700S120000, C700S121000, C430S005000, C378S035000
Reexamination Certificate
active
08082525
ABSTRACT:
Embodiments of a method for determining a mask pattern to be used on a photo-mask in a lithography process are described. This method may be performed by a computer system. During operation, this computer system receives at least a portion of a first mask pattern including first regions that violate pre-determined rules associated with the photo-mask. Next, the computer system determines a second mask pattern based on at least the portion of the first mask pattern, where the second mask pattern includes second regions that are estimated to comply with the pre-determined rules. Note that the second regions correspond to the first regions, and the second mask pattern is determined using a different technique than that used to determine the first mask pattern.
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Liu Yong
McCarty John F.
Pang Linyong
Russell Kelly Gordon
Kik Phallaka
Luminescent Technologies Inc.
Wilson Sonsini Goodrich & Rosati
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