Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-11-25
1987-09-01
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
428432, C23C 1400
Patent
active
046907459
ABSTRACT:
Oxide-ceramic targets which can be used in magnetically enhanced cathode sputtering and which are based on hot-pressed indium oxide/tin oxide mixtures, which have a density of at least 75% of the theoretical density and which have been diminished to such an extent in the oxygen content compared with the stoichiometric composition that they have an electrical conductivity which corresponds to a specific resistance of 0.6 to 0.1 .OMEGA.. cm can be prepared by compression-molding the metal oxide mixture in a reducing atmosphere under a pressure of 50 to 600 kg/cm.sup.2 and at a temperature of 850.degree. to 1,000.degree. C.
The targets can be used in direct-voltage sputtering.
REFERENCES:
patent: 3438885 (1969-04-01), Lewis et al.
patent: 3749658 (1973-07-01), Vossen, Jr.
patent: 4025339 (1977-05-01), Kuehnle
patent: 4060426 (1977-11-01), Zinchuk
patent: 4065600 (1977-12-01), King et al.
patent: 4124474 (1978-11-01), Bomchil
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4201649 (1980-05-01), Gillery
patent: 4400254 (1983-08-01), Freller et al.
Fraser et al., J. Electrochem. Soc. 119 (1972), pp. 1368-1374.
Demers Arthur P.
Merck Patent Gesellschaft mit beschrankter Haftung
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