Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-10-24
1991-11-19
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429813, 20429819, C23C 1434
Patent
active
050663810
ABSTRACT:
A target unit includes a backing plate and a target member disposed on the backing plate. The target member includes at least one erosion member of a sputtering material and at least one holding member for releasably holding the erosion member on the backing plate.
REFERENCES:
patent: 4200510 (1980-04-01), O'Connell et al.
patent: 4421628 (1983-12-01), Quaderer
patent: 4468313 (1984-08-01), Okumura et al.
patent: 4485000 (1984-11-01), Kawaguchi et al.
Hijikata Kenichi
Murakami Yoshiteru
Ohta Kenji
Shingyoji Takyuki
Takaishi Kazushige
Mitsubishi Metal Corporation
Sharp Kabushiki Kaisha
Weisstuch Aaron
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