Target for the sputtering cathode of a vacuum coating apparatus

Details Target for the sputtering cathode of a vacuum coating apparatus Target for the sputtering cathode of a vacuum coating apparatus

1996-09-25

2000-03-21

McDonald, Rodney

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429813, C23C 1434

Patent

active

060398558

ABSTRACT:
A frame (3, 4, 5, . . . 7) at least partially surrounds the target material (19), and serves to mount the target on the cathode backing plate (9), with a separating film or interlayer (20) of soft material disposed between the frame and the cathode backing plate. The frame (3, 4, 5, . . . 7) is provided with a plurality of projections (3a, 3b, . . . 4a, 4b, . . . 7a, 7b . . . ) affixed to the frame members (3, 4, 5, . . . 7) and extending into the target material in order to hold the target material (19) in the spaces (A, B, C) surrounded by the frame members. The target is preferably cast directly into the frame while the frame is fixed to a stainless steel plate, then removed together with the frame after cooling and mounted to the cathode plate.

REFERENCES:
patent: 4405436 (1983-09-01), Kobayashi et al.
patent: 4668373 (1987-05-01), Rille et al.
patent: 4982269 (1991-01-01), Calligaro
patent: 4983269 (1991-01-01), Wegmann
patent: 5334298 (1994-08-01), Gegenwart

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