Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-03-29
2005-03-29
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298130, C427S008000, C073S866000
Reexamination Certificate
active
06872284
ABSTRACT:
A method of constructing increased life sputter targets and targets made by the method are disclosed. The method comprises starting with a precursor target design or profile and making magnetic field strength measurements along the radial surface of same and at a plurality of vertical dimensions above the surface. An optimal magnetic field strength ratio is provided between the erosion tracks of the target. The vertical dimension of the material to be added to one of the erosion tracks is determined and then the height of the other erosion track is calculated by utilizing this optimal magnetic field strength ratio.
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The Design of Rotating Magnet Sputter Sources; Robert J. Kolenkow, Craig Armstrong.
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Ivanov Eugene Y.
Smathers David B.
Wickersham, Jr. Charles E.
Zhu Lin
Tosoh SMD, Inc.
Versteeg Steven
Wegman Hessler & Vanderburg
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