Tantalum amide complexes for depositing tantalum-containing...

Details Tantalum amide complexes for depositing tantalum-containing... Tantalum amide complexes for depositing tantalum-containing...

2005-11-01

2005-11-01

Nazario-Gonzalez, Porfirio (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

C427S252000

Reexamination Certificate

active

06960675

ABSTRACT:
Tantalum precursors useful in depositing tantalum nitride or tantalum oxides materials on substrates, by processes such as chemical vapor deposition and atomic layer deposition. The precursors are useful in forming tantalum-based diffusion barrier layers on microelectronic device structures featuring copper metallization and/or ferroelectric thin films.

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patent: 6015917 (2000-01-01), Bhandari et al.
patent: 6552209 (2003-04-01), Lei et al.
patent: 6593484 (2003-07-01), Yasuhara et al.

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