Tandem process chamber

Details Tandem process chamber Tandem process chamber

1996-11-18

2000-11-28

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723MP, C23C 1600

Patent

active

061520705

ABSTRACT:
The present invention provides an apparatus for vacuum processing generally comprising an enclosure having a plurality of isolated chambers formed therein, a gas distribution assembly disposed in each processing chamber, a gas source connected to the plurality of isolated chambers, and a power supply connected to each gas distribution assembly.

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