Table of wafer polishing apparatus, method for polishing...

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

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C451S028000

Reexamination Certificate

active

07040963

ABSTRACT:
A table for a wafer polishing apparatus having superior heat-resistant, anti-thermal-shock, and anti-abrasion characteristics and capable of increasing the diameter of a semiconductor wafer while improving the quality of the wafer. The table (2) includes a plurality of superimposed bases (11) each of which is formed of silicide ceramic or carbide ceramic. The bases (11) are joined together by an adhesive layer (14). A fluid passage (12) is formed in a joining interface between the bases (11).

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patent: 2003/0008598 (2003-01-01), Jimbo et al.
patent: 0860238 (1998-08-01), None
patent: 09150351 (1997-06-01), None
patent: 10235552 (1998-09-01), None
patent: 11090814 (1999-04-01), None

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