Systems configured to reduce distortion of a resist during a...

Radiant energy – Inspection of solids or liquids by charged particles – Electron microscope type

Reexamination Certificate

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C250S443100, C250S397000, C250S306000, C250S310000, C356S036000

Reexamination Certificate

active

11215745

ABSTRACT:
Various systems configured to reduce distortion of a resist during a metrology process are provided. The systems include an electron beam metrology tool configured to measure one or more characteristics of one or more resist features formed on a specimen. The electron beam metrology tool may be configured as a scanning electron microscope. The resist may be designed for exposure at a wavelength of about 193 nm. One system includes a cooling subsystem configured to alter a temperature of the specimen during measurements by the tool such that the resist feature(s) are not substantially distorted during the measurements. Another system includes a drying subsystem that is configured to reduce moisture proximate the specimen during measurements by the electron beam metrology tool such that the resist feature(s) are not substantially distorted during the measurements. An additional system may include both the cooling subsystem and the drying subsystem.

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patent: 8-222175 (1996-08-01), None
patent: 2001-319923 (2001-11-01), None
Hoffman et al., “Investigation of 193 nm Resist Shrinkage During CD-SEM Measurement,” Yield Management Solutions, 2001, pp. 32-36.

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