Systems and methods for removing residue from process gases exha

Details Systems and methods for removing residue from process gases exha Systems and methods for removing residue from process gases exha

1998-05-28

2000-02-01

Smith, Duane S.

Gas separation: processes

Solid sorption

And liquid contact

95 94, 95212, 95224, 95281, 96122, 96130, 96131, 96143, 96228, 96290, 96300, 96378, B01D 4714, B01D 5304

Patent

active

060198168

ABSTRACT:
Process gases from microelectronic device fabrication processes are pumped through a filter unit including a plurality of absorbers for absorbing water entrained within the process gases. Residues deposited within the filtering unit are removed by spraying water on the absorbers. Water is prevented from escaping from the filtering unit into other portions of an exhaust gas system or into the environment by providing a curtain of pressurized, inert gas, within the filtering unit.

REFERENCES:
patent: 3122594 (1964-02-01), Kielback
patent: 3302372 (1967-02-01), Hynson et al.
patent: 3432994 (1969-03-01), Whiton et al.
patent: 3507051 (1970-04-01), Calvert et al.
patent: 3556490 (1971-01-01), Bockman
patent: 3739551 (1973-06-01), Eckert
patent: 4105722 (1978-08-01), Sorenson
patent: 4110088 (1978-08-01), Cold et al.
patent: 4906257 (1990-03-01), Fukunaga et al.
patent: 4940213 (1990-07-01), Ohmine et al.
patent: 5211729 (1993-05-01), Sherman
patent: 5460636 (1995-10-01), Harada et al.
patent: 5584959 (1996-12-01), Kimura et al.
patent: 5649985 (1997-07-01), Imamura
patent: 5735919 (1998-04-01), Fujii et al.
patent: 5743939 (1998-04-01), Lee et al.
patent: 5788747 (1998-08-01), Horiuchi et al.
patent: 5820658 (1998-10-01), Kim et al.
patent: 5851293 (1998-12-01), Lane et al.
patent: 5855651 (1999-01-01), Kurita et al.

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