Systems and methods for forming metal oxides using metal...

Details Systems and methods for forming metal oxides using metal... Systems and methods for forming metal oxides using metal...

2005-10-25

2005-10-25

Wilczewski, M. (Department: 2822)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S785000, C438S240000

Reexamination Certificate

active

06958300

ABSTRACT:
A method of forming (and an apparatus for forming) a metal oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process and one or more precursor compounds that include organo-amine ligands and one or more precursor compounds that include organo-oxide ligands.

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