Systems and methods for fluid flow control in an immersion...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

07443483

ABSTRACT:
Systems and methods for controlling fluid flow in an immersion lithography system. The system includes a fluid flow path that allows fluid to flow from a source through a fluid retention hood and then a fluid control valve. The system includes a pressure sensing system for determining a pressure drop across the fluid retention hood. The pressure drop across the fluid retention hood changes with the fluid flow rate. A control system receives signals indicating the pressure drop across the fluid retention hood and produces control signals for the fluid control valve. The control signals adjust the fluid flow rate through the fluid control valve to drive the flow rate to a desired rate, thereby driving the sensed pressure drop across the fluid retention hood to a desired pressure drop.

REFERENCES:
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patent: 2005/0179877 (2005-08-01), Mulkens et al.
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patent: 2005/0259236 (2005-11-01), Straaijer
patent: 2005/0263068 (2005-12-01), Hoogendam et al.
patent: 2005/0270506 (2005-12-01), Streefkerk et al.
patent: 2006/0072089 (2006-04-01), Eussen et al.
International Search Report and Written Opinion mailed Jul. 31, 2008 for International Application No. PCT/US2007/016673.

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