Systems and methods for EUV light source metrology

Radiant energy – Radiant energy generation and sources – With radiation modifying member

Reexamination Certificate

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C250S3960ML, C250S493100, C378S019000, C372S005000

Reexamination Certificate

active

11177501

ABSTRACT:
Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi2/Si multi-layer mirror.

REFERENCES:
patent: 2759106 (1956-08-01), Wolter
patent: 3150483 (1964-09-01), Mayfield et al.
patent: 3232046 (1966-02-01), Meyer
patent: 3279176 (1966-10-01), Boden
patent: 3746870 (1973-07-01), Demarest
patent: 3960473 (1976-06-01), Harris
patent: 3961197 (1976-06-01), Dawson
patent: 3969628 (1976-07-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4088966 (1978-05-01), Samis
patent: 4143275 (1979-03-01), Mallozzi et al.
patent: 4162160 (1979-07-01), Witter
patent: 4203393 (1980-05-01), Giardini
patent: 4223279 (1980-09-01), Bradford, Jr. et al.
patent: 4245160 (1981-01-01), Harao
patent: 4455658 (1984-06-01), Sutte et al.
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4534035 (1985-08-01), Long
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4550408 (1985-10-01), Karning et al.
patent: 4596030 (1986-06-01), Herziger et al.
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4626193 (1986-12-01), Gann
patent: 4633492 (1986-12-01), Weiss et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4751723 (1988-06-01), Gupta et al.
patent: 4752946 (1988-06-01), Gupta et al.
patent: 4837794 (1989-06-01), Riordan et al.
patent: 4891820 (1990-01-01), Rando et al.
patent: 4959840 (1990-09-01), Akins et al.
patent: 5005180 (1991-04-01), Edelman et al.
patent: 5023884 (1991-06-01), Akins et al.
patent: 5023897 (1991-06-01), Neff et al.
patent: 5025445 (1991-06-01), Anderson et al.
patent: 5025446 (1991-06-01), Kuizenga
patent: 5027076 (1991-06-01), Horsley et al.
patent: 5070513 (1991-12-01), Letardi
patent: 5102776 (1992-04-01), Hammer et al.
patent: 5126638 (1992-06-01), Dethlefsen
patent: 5142166 (1992-08-01), Birx
patent: 5189678 (1993-02-01), Ball et al.
patent: 5313481 (1994-05-01), Cook et al.
patent: 5315611 (1994-05-01), Ball et al.
patent: 5359620 (1994-10-01), Akins
patent: 5411224 (1995-05-01), Dearman et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5471965 (1995-12-01), Kapich
patent: 5504795 (1996-04-01), McGeoch
patent: 5729562 (1998-03-01), Birx et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5852621 (1998-12-01), Sandstrom
patent: 5856991 (1999-01-01), Ershov
patent: 5863017 (1999-01-01), Larson et al.
patent: 5866871 (1999-02-01), Birx
patent: 5936988 (1999-08-01), Partlo et al.
patent: 5953360 (1999-09-01), Vitruk et al.
patent: 5963616 (1999-10-01), Silfvast et al.
patent: 5978394 (1999-11-01), Newman et al.
patent: 5991324 (1999-11-01), Knowles et al.
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6016325 (2000-01-01), Ness et al.
patent: 6018537 (2000-01-01), Hofmann et al.
patent: 6028880 (2000-02-01), Carlesi et al.
patent: 6031241 (2000-02-01), Silfvast et al.
patent: 6039850 (2000-03-01), Schulz
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6067311 (2000-05-01), Morton et al.
patent: 6094448 (2000-07-01), Fomenkov et al.
patent: 6104735 (2000-08-01), Webb
patent: 6128323 (2000-10-01), Myers et al.
patent: 6151346 (2000-11-01), Partlo et al.
patent: 6151349 (2000-11-01), Gong et al.
patent: 6164116 (2000-12-01), Rice et al.
patent: 6172324 (2001-01-01), Birx
patent: 6192064 (2001-02-01), Algots et al.
patent: 6208674 (2001-03-01), Webb et al.
patent: 6208675 (2001-03-01), Webb
patent: 6219368 (2001-04-01), Govorkov
patent: 6240117 (2001-05-01), Gong et al.
patent: 6359922 (2002-03-01), Partlo et al.
patent: 6370174 (2002-04-01), Onkels et al.
patent: 6377651 (2002-04-01), Richardson et al.
patent: 6381257 (2002-04-01), Ershov et al.
patent: 6392743 (2002-05-01), Zambon et al.
patent: 6404784 (2002-06-01), Komine
patent: 6414979 (2002-07-01), Ujazdowski et al.
patent: 6442181 (2002-08-01), Oliver et al.
patent: 6452199 (2002-09-01), Partlo et al.
patent: 6466602 (2002-10-01), Fleurov et al.
patent: 6477193 (2002-11-01), Oliver et al.
patent: 6493374 (2002-12-01), Fomenkov et al.
patent: 6529531 (2003-03-01), Everage et al.
patent: 6532247 (2003-03-01), Spangler et al.
patent: 6535531 (2003-03-01), Smith et al.
patent: 6538737 (2003-03-01), Sandstrom et al.
patent: 6541786 (2003-04-01), Partlo et al.
patent: 6549551 (2003-04-01), Ness et al.
patent: 6566667 (2003-05-01), Partlo et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6567450 (2003-05-01), Myers et al.
patent: 6584132 (2003-06-01), Morton
patent: 6586757 (2003-07-01), Melnychuk et al.
patent: 6621846 (2003-09-01), Sandstrom et al.
patent: 6625191 (2003-09-01), Knowles et al.
patent: 6671294 (2003-12-01), Kroyan et al.
patent: 6721340 (2004-04-01), Fomenkov et al.
patent: 6757316 (2004-06-01), Newman et al.
patent: 6782031 (2004-08-01), Hofmann et al.
patent: 6792016 (2004-09-01), Kugler
patent: 6795474 (2004-09-01), Partlo et al.
patent: 2001/0055364 (2001-12-01), Kandaka et al.
patent: 2002/0006149 (2002-01-01), Spangler et al.
patent: 2002/0012376 (2002-01-01), Das et al.
patent: 2002/0014598 (2002-02-01), MeInychuk et al.
patent: 2002/0014599 (2002-02-01), Rauch et al.
patent: 2002/0048288 (2002-04-01), Kroyan et al.
patent: 2002/0100882 (2002-08-01), Partlo et al.
patent: 2002/0101589 (2002-08-01), Sandstrom et al.
patent: 2002/0105994 (2002-08-01), Partlo et al.
patent: 2002/0114370 (2002-08-01), Onkels et al.
patent: 2002/0163313 (2002-11-01), Ness et al.
patent: 2002/0168049 (2002-11-01), Schriever et al.
patent: 2003/0006383 (2003-01-01), MeInychuk et al.
patent: 2003/0068012 (2003-04-01), Ahmad et al.
patent: 2003/0142280 (2003-07-01), Bakker et al.
patent: 2004/0047385 (2004-03-01), Knowles et al.
patent: 2004/0156052 (2004-08-01), Yamamoto et al.
patent: 2004/0253426 (2004-12-01), Yakshin et al.
patent: 2005/0120953 (2005-06-01), Banine et al.
patent: 2005/0230645 (2005-10-01), Melnychuk et al.
patent: 2005/0254154 (2005-11-01), del Puerto
patent: 2006/0131515 (2006-06-01), Partlo et al.
patent: 2006/0176925 (2006-08-01), Nakano
patent: 2006/0278833 (2006-12-01), Van Herpen et al.
patent: 2007/0001130 (2007-01-01), Bykanov et al.
patent: 10244303 (2004-04-01), None
patent: 02-105478 (1990-04-01), None
patent: 03-173189 (1991-07-01), None
patent: 06-053594 (1994-02-01), None
patent: 09-219555 (1997-08-01), None
patent: 2000-058944 (2000-02-01), None
Bollanti et al., “Compact three electrodes excimer laser iANUS for a POPA optical system,” SPIE Proc. (2206) 144-153, (1994).
Bollanti et al., “Ianus, the three-electrode excimer laser,” App. Phys. B (Lasers & Optics) 66(4):401-406, (1998).
Choi et al., “A 1013 A/s high energy density micro discharge radiation source,” B. Radiation Characteristics, p. 287-290.
Choi et al., “Fast pulsed hollow cathode capillary discharge device,” Rev. of Sci. Instrum. 69(9):3118-3122 (1998).
Coutts et al., “High average power blue generation from a copper vapour laser pumped titanium sapphire laser”, Journal of Modern Optics, vol. 45, No. 6, p. 1185-1197 (1998).
Fomenkov et al., “Characterizaiton of a 13.5nm source for EUV lithography based on a dense plasma focus and lithium emission,” Sematech Intl. Workshop on EUV Lithography (Oct. 1999).
Hansson et al., “Xenon liquid jet laser-plasma source for EUV lithography,” Emerging Lithographic Technologies I

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