Systems and methods for drying a rotating substrate

Details Systems and methods for drying a rotating substrate Systems and methods for drying a rotating substrate

2010-01-12

2011-11-15

Gravini, Stephen M. (Department: 3743)

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

C034S080000, C034S058000, C034S218000, C392S380000, C392S384000, C705S014270, C428S195100, C428S343000, C118S666000, C118S052000, C526S243000, C526S319000

Reexamination Certificate

active

08056253

ABSTRACT:
A system of drying a surface of a substrate is provided. The system includes a rotary support for supporting a substrate; and an assembly comprising a first dispenser, a second dispenser, and a third dispenser, the assembly positioned above the surface of the substrate, the second and third dispensers positioned on the assembly adjacent to and in contact with one another and spaced from the first dispenser, the second dispenser having an opening that is larger than an opening of the third dispenser, and the second dispenser being located between the first and third dispensers; and means for translating the assembly generally parallel to the surface of the substrate.

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