Systems and method for forming silicon oxide layers

Details Systems and method for forming silicon oxide layers Systems and method for forming silicon oxide layers

2006-10-03

2006-10-03

Kebede, Brook (Department: 2823)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S787000

Reexamination Certificate

active

07115528

ABSTRACT:
A method of forming (and apparatus for forming) a metal oxide layer, preferably a dielectric layer, on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process and ozone with one or more metal organo-amine precursor compounds.

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