Data processing: measuring – calibrating – or testing – Measurement system – Performance or efficiency evaluation
Reexamination Certificate
2005-04-26
2005-04-26
Tsai, Carol S. W. (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system
Performance or efficiency evaluation
C382S149000, C382S145000, C702S035000
Reexamination Certificate
active
06885977
ABSTRACT:
A method (400) for determining a response to a wafer manufacturing process problem includes the steps of generating a wafer map signature (406) containing defect attributes to be identified and retrieving (410) one or more wafer map signatures from a database. The wafer map signature to be identified is matched (414) with the one or more wafer map signatures from the database in order to help find a root cause of a defect in a wafer manufacturing process.This provides at least the advantage that a signature matching capability allows an Operator to more accurately identify a root manufacturing cause of a wafer defect. Furthermore, instant feedback to the wafer manufacturing process can be provided to facilitate rapid correction of manufacturing errors.
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Dor Amos
Gavra Yifah
Applied Materials Inc.
Blakely & Sokoloff, Taylor & Zafman
Tsai Carol S. W.
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