System processing a substrate using dynamic liquid meniscus

Details System processing a substrate using dynamic liquid meniscus System processing a substrate using dynamic liquid meniscus

2008-07-08

2008-07-08

Gravini, S. (Department: 3749)

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

C034S080000, C034S090000, C134S902000, C216S084000, C438S745000

Reexamination Certificate

active

07395611

ABSTRACT:
A system and method of moving a meniscus from a first surface to a second surface includes forming a meniscus between a head and a first surface. The meniscus can be moved from the first surface to an adjacent second surface, the adjacent second surface being parallel to the first surface. The system and method of moving the meniscus can also be used to move the meniscus along an edge of a substrate.

REFERENCES:
patent: 5997653 (1999-12-01), Yamasaka
patent: 6491764 (2002-12-01), Mertens et al.
patent: 6988326 (2006-01-01), O'Donnell et al.
patent: 6988327 (2006-01-01), Garcia et al.
patent: 7127831 (2006-10-01), Garcia et al.

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