Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-02-14
2006-02-14
Lebentritt, Michael S. (Department: 2812)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S689000
Reexamination Certificate
active
06998349
ABSTRACT:
A system and method of generating RF includes a supply voltage source, an oscillator, an output amplifier, a load network, a peak voltage detector and a comparator circuit. The oscillator has a control signal input and an RF signal output. The output amplifier is coupled to the oscillator output. The load network is coupled between an output of the output amplifier and an output of the RF generator. The peak voltage detector is coupled across the output amplifier. The comparator circuit includes a first input coupled to the supply voltage source, a second input coupled to an output of the peak voltage detector, and a comparator output coupled to the oscillator control signal input.
REFERENCES:
patent: 4221964 (1980-09-01), Schlereth et al.
patent: 4317223 (1982-02-01), Farmer, Jr.
patent: 4607323 (1986-08-01), Sokal et al.
patent: 4820377 (1989-04-01), Davis et al.
patent: 5349166 (1994-09-01), Taylor
patent: 5543604 (1996-08-01), Taylor
patent: 5562778 (1996-10-01), Koretsky et al.
patent: 5601655 (1997-02-01), Bok et al.
patent: 5750971 (1998-05-01), Taylor
patent: 5931173 (1999-08-01), Schiele
patent: 5980647 (1999-11-01), Buker et al.
patent: 6016821 (2000-01-01), Puskas
patent: 6019757 (2000-02-01), Scheldrup
patent: 6090106 (2000-07-01), Goble et al.
patent: 6311702 (2001-11-01), Fishkin
patent: 6333268 (2001-12-01), Starov et al.
patent: 6365063 (2002-04-01), Collins et al.
patent: 6368482 (2002-04-01), Oeftering et al.
patent: 6370005 (2002-04-01), Sun et al.
patent: 6395096 (2002-05-01), Madanshetty
patent: 6413873 (2002-07-01), Li et al.
patent: 6445126 (2002-09-01), Arai et al.
patent: 6503454 (2003-01-01), Hadimioglu et al.
patent: 6623700 (2003-09-01), Horine et al.
patent: 6681781 (2004-01-01), Puri et al.
patent: 6706337 (2004-03-01), Hebert
patent: 6713022 (2004-03-01), Noolandi et al.
patent: 6730176 (2004-05-01), Kuyel
patent: 6773954 (2004-08-01), Subramanian et al.
patent: 6822372 (2004-11-01), Puskas
International Search Report dated Oct. 18, 2004.
Nathan O. Sokal, “Class E-A New Class of High-Efficiency Tuned Single-Ended Switching Power Amplifiers”, Jun., 1975,IEEE Journal of Solid-State Circuits.
Anderson Thomas W.
Kuthi Andras
Lam Research Corporation
Lebentritt Michael S.
Luk Olivia T.
Martine & Penilla & Gencarella LLP
LandOfFree
System, method and apparatus for automatic control of an RF... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System, method and apparatus for automatic control of an RF..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System, method and apparatus for automatic control of an RF... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3688163