System, method and apparatus for applying liquid to a CMP...

Details System, method and apparatus for applying liquid to a CMP... System, method and apparatus for applying liquid to a CMP...

2005-03-29

2005-03-29

Thomas, David B. (Department: 3723)

Abrading

Abrading process

Abradant supplying

C451S056000

Reexamination Certificate

active

06872128

ABSTRACT:
A system and method of delivering a liquid to a CMP polishing pad includes supplying the liquid to a nozzle, the nozzle being oriented toward a polishing surface of the CMP polishing pad. The liquid flows at a rate of less than or equal to about 100 cc per minute. A pressurized carrier gas is also supplied to the nozzle. The liquid is substantially evenly sprayed from the nozzle onto the CMP polishing pad.

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