Photocopying – Projection printing and copying cameras – Detailed holder for original
Reexamination Certificate
2007-12-04
2007-12-04
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Detailed holder for original
C355S072000
Reexamination Certificate
active
10369108
ABSTRACT:
A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The reticle and cover are moved to a stage using a robot gripper. The reticle and cover may be coupled to a baseplate before being moved. Corresponding alignment devices are coupled to the frame and the panel, the gripper and the panel, and the baseplate and the panel. The stage and the frame can have corresponding attachment devices. A pre-alignment device can be used to align the reticle before transporting it to a stage. The pre-alignment device and the frame can have corresponding alignment devices that can be used to perform the pre-alignment. Predetermined areas of the reticle can be hardened or shaped, such that less particles are produced during contact with the reticle.
REFERENCES:
patent: 3615006 (1971-10-01), Freed
patent: 4248508 (1981-02-01), Watkin
patent: 4549843 (1985-10-01), Jagusch et al.
patent: 5308989 (1994-05-01), Brubaker
patent: 5422704 (1995-06-01), Sego
patent: 5611452 (1997-03-01), Bonora et al.
patent: 5964561 (1999-10-01), Marohl
patent: 6055040 (2000-04-01), Sego
patent: 6197454 (2001-03-01), Yan
patent: 6216873 (2001-04-01), Fosnight et al.
patent: 6224679 (2001-05-01), Sasaki et al.
patent: 6239863 (2001-05-01), Catey et al.
patent: 6279249 (2001-08-01), Dao et al.
patent: 6280886 (2001-08-01), Yan
patent: 6317479 (2001-11-01), Chiba et al.
patent: 6499935 (2002-12-01), Hirakawa et al.
patent: 6566018 (2003-05-01), Muzio et al.
patent: 6607984 (2003-08-01), Lee et al.
patent: 6630988 (2003-10-01), Greene, Jr. et al.
patent: 6646720 (2003-11-01), Ramamoorthy et al.
patent: 6715495 (2004-04-01), Dao et al.
patent: 6732746 (2004-05-01), Dao et al.
patent: 6734443 (2004-05-01), Zheng et al.
patent: 6734445 (2004-05-01), Ramamoorthy et al.
patent: 6763608 (2004-07-01), Dao et al.
patent: 6803159 (2004-10-01), Enloe
patent: 6906783 (2005-06-01), Del Puerto et al.
patent: 7209220 (2007-04-01), Puerto et al.
patent: 2001/0031404 (2001-10-01), Caminos et al.
patent: 2002/0021781 (2002-02-01), Chiba et al.
patent: 2002/0066692 (2002-06-01), Smith et al.
patent: 2002/0092144 (2002-07-01), Nguyen et al.
patent: 2002/0154285 (2002-10-01), Ramamoorthy et al.
patent: 2002/0155358 (2002-10-01), Cullins et al.
patent: 2003/0082461 (2003-05-01), Carpi
patent: 2003/0227605 (2003-12-01), del Puerto et al.
patent: 0 525 293 (1993-02-01), None
patent: 0 582 018 (1994-02-01), None
patent: 1 341 042 (2003-09-01), None
patent: 56-24335 (1981-03-01), None
patent: 2-98122 (1990-04-01), None
Partial European Search Report for Appln. No. EP 03 00 3288, mailed Jul. 25, 2003, 3 pages.
European Search Report for Appln. 03 003 228.2 mailed Feb. 12, 2004.
English Translation of JP published application No. 02-98122, dated Apr. 10, 1990.
Office Action for Chinese Patent Application No. 03142306.X, mailed on Jun. 10, 2005, 10 pages.
Yoshitake, S. et al., “New Mask Blank Handling System for the Advanced Electron Beam Writer,”Proceedings of SPIE: 19th Annual Symposium on Photomask Technology, vol. 3874, Part 2, pp. 905-915, Sep. 1999.
Office Action (and English translation) for Korean Appln. No. 10-2003-0011231, dated Jul. 25, 2005.
Search Report for Singapore Patent Appln. No. 200301191-3, 6 pages, dated Mar. 30, 2004.
Office Action (and English translation) from Chinese Patent Appln. No. 03142306.X, 6 pages, dated Feb. 10, 2006.
Office Action (and English translation) from Japanese Patent Appln. No. 2003-046630, 5 pages, dated Jul. 11, 2007.
del Puerto et al., “System and Method for Using a Two Part Cover and a Box for Protecting a Reticle”, U.S. Appl. No. 11/785,548, filed Apr. 18, 2007.
Alikhan Abdullah
del Puerto Santiago
Feroce Jonathan H.
Kish Duane P.
Loopstra Eric R.
ASML Holding N.V.
Kim Peter B.
Sterne Kessler Goldstein and Fox P.L.L.C.
LandOfFree
System for using a two part cover for protecting a reticle does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System for using a two part cover for protecting a reticle, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for using a two part cover for protecting a reticle will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3859658