System for measuring a topographical feature on a specimen

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

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250307, 250397, H01J 3728

Patent

active

049419803

ABSTRACT:
A system for measuring a topographical feature on a specimen including apparatus for scanning an electron beam across the feature at high speed, first and second electron detector apparatus organized in pairs, apparatus for signal processing of a first signal received from the first electron detector apparatus thereby to identify elements of a cross-sectional profile of the feature, apparatus for signal processing of a second signal received from the second electron detector apparatus generally separately from the signal processing of the first signal thereby to identify elements of a cross-sectional profile of the feature, and apparatus for incorporating the elements identified from the first electron detector apparatus and the elements identified from the second electron detector apparatus thereby to produce a composite picture of the feature.

REFERENCES:
patent: 3329813 (1967-07-01), Hashimoto
patent: 3920990 (1975-11-01), Van Nieuwland et al.
patent: 4177379 (1979-12-01), Fuukawa et al.
patent: 4217495 (1980-08-01), robinson
patent: 4219731 (1980-08-01), Migitaka et al.
patent: 4308457 (1981-12-01), Reimer
patent: 4535249 (1985-08-01), Reeds
patent: 4588890 (1986-05-01), Finnes
patent: 4600839 (1986-07-01), Ichihashi et al.
Postek and Joy, "Submicrometer microelectronics dimensional metrology scanning electron microscopy", J. Res. of the NBS, 1987, 92(3), 205-228.
T. Ahmed et al., "Low voltage SEM metrology for pilot line application,"SPIE, 1987, 775, 80-88.
P. W. Grant, "Use of scanning electron microscope for critical dimension measurement on a semiconductor production line", SPIE, 1985, 565, 169-172.
G. Matsuoka et al., "Automatic electron beam metrology system", J. Vac. Sci. Tech. B., 1987, 5, 79-83.

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