System for ion energy control during plasma processing

Details System for ion energy control during plasma processing System for ion energy control during plasma processing

1998-04-09

2000-08-01

Vu, David

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511151, 118723I, H05H 100

Patent

active

060971576

ABSTRACT:
An apparatus and method for controlling the plasma potential of a plasma within a plasma chamber (50) is disclosed. The apparatus and method utilize a Faraday shielded inductive source antenna (60) to generate the plasma within the plasma chamber (50) and an electrically conductive probe (100) that is inserted into the plasma chamber (50) to regulate the plasma potential. By independent biasing of the conductive probe (100), which regulates the plasma potential, the ion energy distribution at a conductive substrate (150) within the plasma chamber (50) may be controlled.

REFERENCES:
patent: 5311103 (1994-05-01), Asmussen et al.
patent: 5423915 (1995-06-01), Breneman
patent: 5435886 (1995-07-01), Breneman
patent: 5436172 (1995-07-01), Breneman
patent: 5453305 (1995-09-01), Beck
patent: 5467013 (1995-11-01), Karlsen
patent: 5472561 (1995-12-01), Powell

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