Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-06-20
2006-06-20
Lin, Sun James (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C719S323000
Reexamination Certificate
active
07065736
ABSTRACT:
A method of generating two-dimensional masks from a three-dimensional model comprises providing a three-dimensional model representing a micro-electro-mechanical structure for manufacture and a description of process mask requirements, reducing the three-dimensional model to a topological description of unique cross sections, and selecting candidate masks from the unique cross sections and the cross section topology. The method further can comprise reconciling the candidate masks based on the process mask requirements description to produce two-dimensional process masks.
REFERENCES:
patent: 5903099 (1999-05-01), Johnson et al.
patent: 6074890 (2000-06-01), Yao et al.
patent: 6082208 (2000-07-01), Rodgers et al.
patent: 6277666 (2001-08-01), Hays et al.
patent: 6563106 (2003-05-01), Bowers et al.
patent: 6567715 (2003-05-01), Sinclair et al.
patent: 6574033 (2003-06-01), Chui et al.
patent: 2002/0086456 (2002-07-01), Cunningham et al.
patent: 2003/0021523 (2003-01-01), De Natale
patent: 2003/0060051 (2003-03-01), Kretschmann et al.
patent: 2003/0062332 (2003-04-01), Harris et al.
Sungwook, Cho, Development of a Geometry-Based Process Planning System for Surface Micromachining, International Journal of Production Research, 2002, vol. 40/No. 5/MAR, pp. 1275-1293, Institution of Production Engineers.
R. Schiek and R. Schmidt, A New, Topolog Driven Method for Automatic Mask Generation from Three-Dimensional Models, Feb. 23, 2003, Sandia National Laboratory, Computational Sciences Department, Albuquerque, New Mexico.
The National Academy of Sciences, 2 Integrated Circuit Based Fabrication Technologies and Materials, Microelectromechanical Systems: Advanced Materials and Fabrication Methods (1997), pp. 14-22, http://www.nap.edu/openbook/0309059801/html.
Farber Madelynne I
Lin Sun James
Sandia Corporation
LandOfFree
System for generating two-dimensional masks from a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System for generating two-dimensional masks from a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for generating two-dimensional masks from a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3640669