Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2011-01-18
2011-01-18
Petkovsek, Daniel (Department: 2874)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C257S531000, C257SE27046, C385S018000, C359S224100
Reexamination Certificate
active
07871529
ABSTRACT:
Novel applications of nanocoil technology and novel methods of fabricating nanocoils for use in such applications and others. Such applications include microscopic electro-mechanical systems (MEMS) devices including nanocoil mirrors, nanocoil actuators and nanocoil antenna arrays. Inductors or traveling wave tubes fabricated from nanocoils are also included. A method for fabricating nanocoils with a desired pitch includes determining a desired pitch for fabricated nanocoil, selecting coiling arm orientation in which coiling arm orientation is arm angle between coiling arm an crystalline orientation of underlying substrate, whereby coiling arm orientation affects pitch of fabricated nanocoil, patterning coiling arm structure with selected coiling arm orientation, and, releasing coiling arm, whereby fabricated nanocoil is formed.
REFERENCES:
patent: 6498557 (2002-12-01), Johnson
patent: 7514301 (2009-04-01), Storaska et al.
patent: 7601620 (2009-10-01), Storaska et al.
patent: 7710235 (2010-05-01), Storaska et al.
Howell Robert S.
Storaska Garrett A.
Andrews & Kurth LLP
Northrop Grumman Systems Corporation
Petkovsek Daniel
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