System for evaluating a design of a mask, exposure system,...

Details System for evaluating a design of a mask, exposure system,... System for evaluating a design of a mask, exposure system,...

2007-04-17

2007-04-17

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

11185679

ABSTRACT:
A system for evaluating a design of a mask includes: an inspection data memory storing initial inspection data of an initial wafer fabricated by an initial mask; a design tool designing a modified mask based on the initial inspection data; a group of manufacturing tools forming an initial mask chip region with the initial mask and a modified mask chip region adjacent to the initial mask region with the modified mask; an inspection tool inspecting faults in the initial and modified mask chip regions; and an evaluation tool evaluating an improvement of the design of the modified mask.

REFERENCES:
patent: 5888675 (1999-03-01), Moore et al.
patent: 2004/0019870 (2004-01-01), Ohmori
patent: 2005/0025351 (2005-02-01), Kotani et al.
patent: 2005/0110997 (2005-05-01), Horie
patent: 2006/0020362 (2006-01-01), Morinaga et al.

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