Photocopying – Projection printing and copying cameras – Focus or magnification control
Reexamination Certificate
2005-05-24
2005-05-24
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Focus or magnification control
C355S075000, C355S077000, C355S057000
Reexamination Certificate
active
06897940
ABSTRACT:
A system for correcting aberration and distortion in EUV lithography places a reticle on a deformable reticle chuck, and a reticle height sensor is used to measure the surface height of the reticle placed on the deformable reticle chuck. An optical system projects EUV radiation onto the reticle and collects and projects reflected EUV radiation from the reticle through its exit pupil onto a wafer placed on a wafer chuck. A deformable mirror disposed proximal to the exit pupil may also be controlled for this purpose. The deformable reticle chuck and the deformable mirror are controlled such that aberration and distortion of an image of the reticle formed on the wafer by the optical system are corrected based on the height measured by the reticle height sensor. The deformable reticle chuck includes a supporting structure, a deformable membrane disposed above and being comprised of a dielectric layer and a conductive layer, a voltage source connected to the conductive coating on the reticle and the conductive layer to generate an electrostatic attractive force between them, a plurality of actuator rods each connected to a corresponding one of actuators, and a coolant gas inside a chamber formed between the membrane and the top surface of the supporting structure. A deformable wafer chuck and wafer height sensor may be included to provide further correction of the image.
REFERENCES:
patent: 4003640 (1977-01-01), Hansen
patent: 4679915 (1987-07-01), Kriz et al.
patent: 4737621 (1988-04-01), Gonsiorowski et al.
patent: 4875765 (1989-10-01), Vandenberg et al.
patent: 5005961 (1991-04-01), O'Brien
patent: 5008702 (1991-04-01), Tanaka et al.
patent: 5026977 (1991-06-01), Hubbard, Jr.
patent: 5142132 (1992-08-01), MacDonald et al.
patent: 5229889 (1993-07-01), Kittell
patent: 5745309 (1998-04-01), Salmon
patent: 5793473 (1998-08-01), Koyama et al.
patent: 6053409 (2000-04-01), Brobst et al.
patent: 6166865 (2000-12-01), Matsuyama
patent: 6229871 (2001-05-01), Tichenor
patent: 20010026358 (2001-10-01), Van Dijsseldonk
patent: 20020011573 (2002-01-01), Van Dijsseldonk
patent: 20020012109 (2002-01-01), Suzuki et al.
patent: 20020017616 (2002-02-01), Ota
patent: 0961149 (1999-01-01), None
patent: 1231513 (2002-08-01), None
patent: 2128733 (1984-05-01), None
patent: WO02056114 (2002-07-01), None
Hardy, John W.,Active Optics: A New Technology for the Control of Light,IEEE, vol. 66, No. 6, Jun. 1978.
Ealey, Mark A.,Active and Adaptive Optical Components: The Technology and Future Trends,SPIE, vol. 1543Active and Adaptive Optical Components, 1991.
Ealey, Mark A.,Actuators: Design Fundamentals, Key Performance Specifications, and Parametric Trades,SPIE, vol. 1543Active and Adaptive Optical Components, 1991.
Tichenor, D.A., et al.,EUV Engineering Test Stand, U.S. Department of Energy, Lawrence Livermore National Laboratory, preprint UCRL-JC-137668, Feb. 14, 2000.
Ealey, Mark A., et al.,Deformable Mirrors: Design Fundamentals, Key Performance Specifications, and Parametric Trades,SPIE, vol. 1543Active and Adaptive Optical Components, 1991.
Mosier, Gary, et al.,Integrated Systems Modeling,Next Generation Space Telescope Presentation, Jan. 14, 1998.
Mosier, Gary, et al.,Integrated Systems Modeling,Next Generation Space Telescope Presentation 197-1, Jan. 14, 1998.
Coulter, Daniel R.,Technology Program Overview,Next Generation Space Telescope, Presentation to the NGST Standing Review Board, Jan. 14, 1998.
Bely, Pierre,NGST Architectures,Space Telescope Science Institute Presentation, Dec. 24, 1997.
Patent Abstracts of Japan, publication no. 2000-326170,Elastically Deformable Electrostatic Chuck And Its Manufacture,Tomaru Kazuhiko, et al., filed May 20, 1999.
Patent Abstracts of Japan, publication no. 62-038839,Sucked Air Quality Controller,Iyoda Hisao, filed Aug. 12, 1985.
Tyson, Robert K,Principles of Adaptive Optics; Academic Press, Inc.
Beyer Weaver & Thomas LLP
Kim Peter B.
Nikon Corporation
LandOfFree
System for correcting aberrations and distortions in EUV... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System for correcting aberrations and distortions in EUV..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for correcting aberrations and distortions in EUV... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3371345