System for cleaning residual paste from a mask

Details System for cleaning residual paste from a mask System for cleaning residual paste from a mask

1999-02-26

2000-03-07

Gulakowski, Randy

Cleaning and liquid contact with solids

Apparatus

With spray or jet supplying and/or applying means

134 61, 134200, 134 64R, 134112R, B08B 300

Patent

active

060326832

ABSTRACT:
A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

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patent: 5114494 (1992-05-01), Remec
patent: 5747439 (1998-05-01), Dunn et al.
patent: 5759289 (1998-06-01), Caron et al.

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