System for and method of gas cluster ion beam processing

Details System for and method of gas cluster ion beam processing System for and method of gas cluster ion beam processing

2008-05-27

2008-05-27

McDonald, Rodney G. (Department: 1795)

Coating apparatus

Gas or vapor deposition

With treating means

C250S492100, C250S492200, C250S492210, C250S492220, C250S492230, C250S492300

Reexamination Certificate

active

10667006

ABSTRACT:
System and method of gas-cluster ion beam processing is realized by incorporating improved beam and workpiece neutralizing components. Larger GCIB current transport is enabled by low energy electron neutralization of space charge of the GCIB. The larger currents transport greater quantities of gas in the GCIB. A vented faraday cup beam measurement system maintains beam dosimetry accuracy despite the high gas transport load.

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Forrester, A. Theodore, Large Ion Beams, pp. 33-41, John Wiley & Sons, NY, 1988.

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