System for analyzing metal impurity on the surface of a single c

Details System for analyzing metal impurity on the surface of a single c System for analyzing metal impurity on the surface of a single c

1991-06-27

1992-09-15

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 45, 378 79, G01N 23223

Patent

active

051484579

ABSTRACT:
A system for analyzing a metal impurity at the surface of a single crystal semiconductor comprising: an incident device for allowing X-ray to be incident, at an incident angle less than a total reflection angle, onto the surface of a wafer in the form of a thin plate comprised of a single crystal semiconductor (e.g., silicon); a wafer fixing/positioning stage wherein when it is assumed that the wafer surface is partitioned by a lattice having an interval d, and that the wavelength of the X-ray from the incident device is .lambda., an angle that the X-ray and the wafer surface form is .theta., and an arbitrary integer is n, the stage is adapted to fix the crystal orientation of the wafer so as to satisfy the condition of "2d sin .theta..noteq.n.lambda.", and to allow sample points to which X-ray is incident to be subjected to positioning by a horizontal movement; and analyzing device for measuring a light quantity of a fluorescent X-ray generated as the result of the fact that the incident X-ray excites atoms at the wafer surface to analyze a quantity of the metal impurity attached on the wafer surface under the condition that the Bragg reflection causing measurement noises does not take place.

REFERENCES:
patent: 4169228 (1979-09-01), Briska et al.
patent: 4358854 (1982-11-01), Marten et al.
patent: 4847882 (1989-07-01), Kroth et al.
patent: 5077766 (1991-12-01), Schwenke et al.

Affiliated with

Also associated with

Rating

System for analyzing metal impurity on the surface of a single c does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System for analyzing metal impurity on the surface of a single c, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System for analyzing metal impurity on the surface of a single c will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-742646