Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-06-27
2006-06-27
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
07069533
ABSTRACT:
A system, apparatus and method for changing/modifying a customer specific reticle set design to a reticle set design that meets a user's process standard. An example embodiment of a method of modifying layout information representing a reticle set design for an integrated circuit comprising the following:receiving layout information and job information; and storing the layout information and the job information; the layout information representing a reticle set design for an integrated circuit and the job information related to the reticle set design;modifying the layout information and the job information to put the layout information and the job information into a first process compatible format;using the layout information and the job information to create mask writer format information for the reticle set design; and storing the mask writer format information; andoutputting the mask writer format information.In other embodiments, the method further comprises receiving changes and/or approval for said mask writer format information; and releasing the mask write format information to a mask shop.
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Kochpatcharin Danchai
Lim Elizabeth
Phuan Yee Hwee
Su Ping Jennifer Teong
Yong Winson
Chatered Semiconductor Manufacturing, LTD
Levin Naum
Siek Vuthe
Stoffel William J.
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