Chemistry: analytical and immunological testing – Automated chemical analysis – With a continuously flowing sample or carrier stream
Reexamination Certificate
2005-07-26
2010-12-14
Nagpaul, Jyoti (Department: 1797)
Chemistry: analytical and immunological testing
Automated chemical analysis
With a continuously flowing sample or carrier stream
C436S180000, C204S198000, C204S240000, C422S091000, C422S105000
Reexamination Certificate
active
07851222
ABSTRACT:
An electrochemical plating system, which includes one or more plating cell reservoirs for storing plating solution and a chemical analyzer in fluidic communication with the one or more plating cell reservoirs. The chemical analyzer is configured to measure chemical concentrations of the plating solution. The plating system further includes a plumbing system configured to facilitate the fluidic communication between the one or more plating cell reservoirs and the chemical analyzer and to substantially isolate the chemical analyzer from electrical noise generated by one or more plating cells of the one or more plating cell reservoirs.
REFERENCES:
patent: 3229198 (1966-01-01), Libby
patent: 3602033 (1971-08-01), Burrell et al.
patent: 3649509 (1972-03-01), Morawetz et al.
patent: 3887110 (1975-06-01), Porter
patent: 4045304 (1977-08-01), Tezuka
patent: 4055751 (1977-10-01), Bussman et al.
patent: 4102756 (1978-07-01), Castellani et al.
patent: 4102770 (1978-07-01), Moriarty et al.
patent: 4110176 (1978-08-01), Creutz et al.
patent: 4132605 (1979-01-01), Tench et al.
patent: 4252027 (1981-02-01), Ogden et al.
patent: 4276323 (1981-06-01), Oka et al.
patent: 4286965 (1981-09-01), Vanhumbeeck et al.
patent: 4314823 (1982-02-01), Rich, Jr. et al.
patent: 4315059 (1982-02-01), Raistrick et al.
patent: 4321322 (1982-03-01), Ahnell
patent: 4326940 (1982-04-01), Eckles et al.
patent: 4336114 (1982-06-01), Mayer et al.
patent: 4364263 (1982-12-01), Sankoorikal et al.
patent: 4376569 (1983-03-01), Barltrop et al.
patent: 4376685 (1983-03-01), Watson
patent: 4405416 (1983-09-01), Raistrick et al.
patent: 4435266 (1984-03-01), Johnston
patent: 4468331 (1984-08-01), Antle et al.
patent: 4469564 (1984-09-01), Okinaka et al.
patent: RE31694 (1984-10-01), Slominski et al.
patent: 4479852 (1984-10-01), Bindra et al.
patent: 4514265 (1985-04-01), Rao et al.
patent: 4528158 (1985-07-01), Gilles et al.
patent: 4595462 (1986-06-01), Vangaever et al.
patent: 4628726 (1986-12-01), Heikkila et al.
patent: 4631116 (1986-12-01), Ludwig
patent: 4692346 (1987-09-01), McBride et al.
patent: 4694682 (1987-09-01), Heikkila et al.
patent: 4725339 (1988-02-01), Bindra et al.
patent: 4750977 (1988-06-01), Marrese
patent: 4774101 (1988-09-01), Harris et al.
patent: 4789445 (1988-12-01), Goffman et al.
patent: 4889611 (1989-12-01), Blough, Jr.
patent: 4932518 (1990-06-01), Bernards et al.
patent: 5039381 (1991-08-01), Mullarkey
patent: 5055425 (1991-10-01), Leibovitz et al.
patent: 5092975 (1992-03-01), Yamamura et al.
patent: 5119020 (1992-06-01), Massey et al.
patent: 5162260 (1992-11-01), Leibovitz et al.
patent: 5182131 (1993-01-01), Hashimoto et al.
patent: 5192403 (1993-03-01), Chang et al.
patent: 5196096 (1993-03-01), Chang et al.
patent: 5222310 (1993-06-01), Thompson et al.
patent: 5223118 (1993-06-01), Sonnenberg et al.
patent: 5224504 (1993-07-01), Thompson et al.
patent: 5230743 (1993-07-01), Thompson et al.
patent: 5244811 (1993-09-01), Matthews
patent: 5256274 (1993-10-01), Poris
patent: 5298129 (1994-03-01), Eliash
patent: 5298132 (1994-03-01), Reddy et al.
patent: 5316974 (1994-05-01), Crank
patent: 5320724 (1994-06-01), Ludwig et al.
patent: 5328589 (1994-07-01), Martin
patent: 5342527 (1994-08-01), Chevallet et al.
patent: 5352350 (1994-10-01), Andricacos et al.
patent: 5364510 (1994-11-01), Caprio
patent: 5368711 (1994-11-01), Poris
patent: 5368715 (1994-11-01), Hurley et al.
patent: 5377708 (1995-01-01), Bergman et al.
patent: 5378628 (1995-01-01), Gratzel et al.
patent: 5389215 (1995-02-01), Horiuchi et al.
patent: 5389546 (1995-02-01), Becket
patent: 5391271 (1995-02-01), Ludwig
patent: 5429733 (1995-07-01), Ishida
patent: 5447615 (1995-09-01), Ishida
patent: 5450870 (1995-09-01), Suga et al.
patent: 5484626 (1996-01-01), Storjohann et al.
patent: 5510018 (1996-04-01), Rey
patent: 5516412 (1996-05-01), Andricacos et al.
patent: 5631845 (1997-05-01), Filev et al.
patent: 5635043 (1997-06-01), Tur'yan et al.
patent: 5705223 (1998-01-01), Bunkofske
patent: 5723028 (1998-03-01), Poris
patent: 5750014 (1998-05-01), Stadler et al.
patent: 5755954 (1998-05-01), Ludwig et al.
patent: 5908540 (1999-06-01), Fanti
patent: 5908556 (1999-06-01), Cavotta et al.
patent: 5932791 (1999-08-01), Hambitzer et al.
patent: 5972192 (1999-10-01), Dublin et al.
patent: 5976341 (1999-11-01), Schmacher et al.
patent: 6017427 (2000-01-01), Yamamoto
patent: 6024856 (2000-02-01), Haydu et al.
patent: 6024857 (2000-02-01), Reid
patent: 6113759 (2000-09-01), Uzoh
patent: 6113771 (2000-09-01), Landau et al.
patent: 6140241 (2000-10-01), Shue et al.
patent: 6176992 (2001-01-01), Talich
patent: 6224737 (2001-05-01), Tsai et al.
patent: 6241953 (2001-06-01), Krijgsman
patent: 6254760 (2001-07-01), Shen et al.
patent: 6258220 (2001-07-01), Dordi et al.
patent: 6280602 (2001-08-01), Robertson
patent: 6365033 (2002-04-01), Graham et al.
patent: 6391209 (2002-05-01), Belongia et al.
patent: 6454927 (2002-09-01), Stevens et al.
patent: 6458262 (2002-10-01), Reid
patent: 6471845 (2002-10-01), Dukovic et al.
patent: 6495453 (2002-12-01), Brongersma et al.
patent: 6551479 (2003-04-01), Graham et al.
patent: 6592736 (2003-07-01), Fulton et al.
patent: 6596148 (2003-07-01), Belongia et al.
patent: 6635157 (2003-10-01), Dordi et al.
patent: 6860944 (2005-03-01), Ivanov et al.
patent: 2002/0153254 (2002-10-01), Belongia et al.
patent: 2002/0180609 (2002-12-01), Ding et al.
patent: 2004/0016637 (2004-01-01), Yang et al.
patent: 2004/0206623 (2004-10-01), D'Ambra et al.
patent: 2005/0053522 (2005-03-01), King et al.
patent: 2005/0077182 (2005-04-01), Balisky et al.
patent: 4405741 (1995-01-01), None
patent: 0180090 (1986-07-01), None
patent: 58-182823 (1983-10-01), None
patent: 62030898 (1987-09-01), None
patent: 10-121297 (1988-05-01), None
patent: 63-118093 (1988-05-01), None
patent: 4-131395 (1992-05-01), None
patent: 04314883 (1992-06-01), None
patent: 4-280993 (1992-10-01), None
patent: 6-017291 (1994-01-01), None
patent: WO 97/12079 (1997-04-01), None
Elsevier B.V. “Study of the zinc electroplating process using electrochemical noise technique” Journal of ectroanalytical Chemistry, Feb. 25, 2005.
Colombo, “Wafer Back Surface Film Removal,” Central R&D, SGS-Thomson Microelectronics, Agrate, Italy.
Singer, “Wafer Processing,” Semiconductor International, Jun. 1998.
Pitney, “NEY Contact Manual,” Electrical Contacts for Low Energy Uses, Oct. 1974.
Tench, et al., “A New Voltammetric Stripping Method Applied to the Determination of the Brighter Concentration in Copper Pyrophosphate Plating Baths”, Journal of the Electrochemical Society, vol. 125, pp. 194-198.
Tench, et al., “Cyclic Pulse Voltammetric Stripping Analysis of Acid Copper Plating Baths”, Journal of Electrochemical Society, Apr. 1985, pp. 831-833.
Haak, et al., “Cyclic Voltammetric Stripping Analysis of Acid Copper Sulfate Plating Baths”, Plating and Surface Finishin, Apr. 1981, pp. 52-55.
Moffatt, et al. “Superconformal Electrodiposition of Copper in 500-90 nm Features”, Journal of the Electrochemical Society, 147 (12) pp. 4524-4535, 2000.
Kelly, et al., “Leveling and Microstructural Effects of Additives for Copper Electrodeposition”, Journal of the Electrochemical Society, 146 (7) pp. 2540-2545, 1999.
Nangoy, et al. U.S. Appl. No. 11/064,747, filed Feb. 23, 2005, entitled Closed Loop Control on Delivery System ECP Slim Cell.
WO/99/57340 International search report 3 pages.
Hoermann Alexander F.
Rabinovich Yevgeniy
Ta Kathryn P.
Applied Materials Inc.
Nagpaul Jyoti
Patterson & Sheridan LLP
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