System and methods for manufacturing a molecular film pattern

Details System and methods for manufacturing a molecular film pattern System and methods for manufacturing a molecular film pattern

2005-09-06

2005-09-06

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S320000, C430S270100

Reexamination Certificate

active

06939665

ABSTRACT:
The invention provides an organic silane molecular film, having a thickness of 3 nm or less and an aromatic hydrocarbon group as a part of the molecular structure of the film that is formed on the surface of the substrate. Accordingly, a molecular film pattern can be efficiently formed by using a molecular film having a superior photolytic property. Additionally, the invention can provide a patterning technique that can easily form a molecular film pattern at a high speed with the number of steps of manufacturing a semiconductor device, as well as the cost, being reduced.

REFERENCES:
patent: 5079600 (1992-01-01), Schnur et al.
Dressick, Walter J. et al., “Patterning of Self-Assembled Films Using Lithographic Exposure Tools”,Jpn. J. Appl. Phys., vol. 32 (1993), pp. 5829-5839.

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