Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-09-13
2005-09-13
Do, Thuan (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000, C703S014000, C430S005000
Reexamination Certificate
active
06944844
ABSTRACT:
A critical dimension, or width, of a feature, or a semiconductor device, can be measured to provide direct and meaningful information regarding the impact of line end shortening, or length, on the function of the device. Specifically, a location on the feature where the width will have an impact on device performance can be selected. Using a simulation, the width at that location can be computed. Given the difficulties of direct measurement of line end shortening and the relationship between the width measurement and the impact on device performance, better layout checking is facilitated than by standard measurements of line end shortening.
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Bever Hoffman & Harms LLP
Do Thuan
Harms Jeanette S.
Synopsys Inc.
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