Optics: measuring and testing – Position or displacement
Reexamination Certificate
2007-10-09
2007-10-09
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
Position or displacement
Reexamination Certificate
active
10882685
ABSTRACT:
A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.
REFERENCES:
patent: 5898453 (1999-04-01), Fischer et al.
patent: 6020964 (2000-02-01), Loopstra et al.
patent: 6172997 (2001-01-01), Miyake et al.
patent: 6188150 (2001-02-01), Spence
patent: 6327025 (2001-12-01), Imai
patent: 6507388 (2003-01-01), Burghoorn
patent: 6977713 (2005-12-01), Luttikhuis et al.
patent: 7105836 (2006-09-01), del Puerto et al.
patent: 7135679 (2006-11-01), Roman et al.
patent: 2001/0006413 (2001-07-01), Burghoorn
patent: 2001/0011712 (2001-08-01), Castenmiller et al.
patent: 2003/0095241 (2003-05-01), Burghoorn
patent: 2003/0117600 (2003-06-01), Taniuchi et al.
patent: 2004/0156049 (2004-08-01), Breninger et al.
patent: 2004/0184014 (2004-09-01), Bakker et al.
patent: 2004/0263846 (2004-12-01), Kwan
patent: 1 111 473 (2001-06-01), None
patent: 1 111 473 (2004-04-01), None
patent: WO 2004/001520 (2003-12-01), None
Stiemerling, et al., “NAT/Firewall NSIS Signaling Layer Protocol(NSLP)”, NSIS Working Group, May 21, 2004, pp. 1-52.
Broekhuijse Jeroen Thomas
Bruinsma Anastasius Jacobus Anicetus
Dressler Sigurd
Hoogendam Christiaan Alexander
Krijnen Edwin Eduard Nicolaas Josephus
Akanbi Isiaka O
ASML Netherlands B.V.
Chowdhury Tarifur
Pillsbury Winthrop Shaw & Pittman LLP
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