Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2007-06-19
2007-06-19
Nadav, Ori (Department: 2811)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S715000, C438S742000
Reexamination Certificate
active
10769408
ABSTRACT:
A system and method of passivating an exposed conductive material includes placing a substrate in a process chamber and injecting a hydrogen species into the process chamber. A hydrogen species plasma is formed in the process chamber. A surface layer species is reduced from a top surface of the substrate is reduced. The reduced surface layer species are purged from the process chamber.
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Tegal Corpo
Bailey III Andrew D.
Lohokare Shrikant P.
Lam Research Corporation
Nadav Ori
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