Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
Reexamination Certificate
2007-07-24
2007-07-24
Nguyen, Tuan H. (Department: 2813)
Semiconductor device manufacturing: process
Radiation or energy treatment modifying properties of...
C438S428000
Reexamination Certificate
active
10931592
ABSTRACT:
A system and method for selectively increasing the thermal effect of a radiant energy source to the surface of an object relative to the substrate is described in the context of rapid thermal processing of semiconductor wafers, and apparatus produced therefrom. A radiation-absorptive atmosphere is introduced between the radiant energy source and the object to increase conductive heat transfer to the surface of the object and reduce the available radiant heat transfer to the substrate, thereby increasing the thermal effect to the surface relative to the substrate.
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Micro)n Technology, Inc.
Nguyen Tuan H.
Schwegman Lundberg Woessner & Kluth P.A.
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