Brushing – scrubbing – and general cleaning – Electrostatic cleaning
Reexamination Certificate
2010-09-20
2011-11-01
Chin, Randall (Department: 3723)
Brushing, scrubbing, and general cleaning
Electrostatic cleaning
C015S004000, C361S230000
Reexamination Certificate
active
08046860
ABSTRACT:
A system for semiconductor wafer manufacturing, comprises a chamber process path for processing the wafer, and a device operable to remove particles from the wafer by electrostatic and electromagnetic methodologies wherein the device is installed in the chamber process path.
REFERENCES:
patent: 5231622 (1993-07-01), Hayashi
patent: 5350428 (1994-09-01), Leroux et al.
patent: 6495215 (2002-12-01), Kamikawa
patent: 2002/0134399 (2002-09-01), Taylor
Chang Ching-Yu
Chang Shih-Ming
Hsia Chen-Yuan
Huang Yen-Bin
Hung Chang-Cheng
Chin Randall
Haynes and Boone LLP
Taiwan Semiconductor Manufacturing Company , Ltd.
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