System and method for removing charges with enhanced efficiency

Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...

Reexamination Certificate

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C257SE21328, C257SE21529, C438S798000

Reexamination Certificate

active

11035048

ABSTRACT:
Method and apparatus for removing and neutralizing charges. The method includes loading a structure into a chamber. The structure includes a first surface and a plurality of charges away from the first surface. Additionally, the method includes supplying a first ionized gas to the first surface of the structure, and radiating the structure with a first ultraviolate light. The supplying a first ionized gas and the radiating the structure with a first ultraviolate light are performed simultaneously for a first period of time.

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patent: 2002/0045328 (2002-04-01), Kobayashi

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